Preparation of Ti-Al-Si-N Nano-composite Films by Reactive Sputtering

Development of Al-Ti-N Composite Coatings on Commercially Pure Ti Surface by Tungsten Inert Gas Process

The present work aims to modify surface properties of pure Ti by development of Ti-Al-N intermetallic composite coatings. In this regard, tungsten inert gas (TIG) cladding process was carried out using Al 1100 as filler rod with Ar and Ar+N2 as shielding gases. Phase and structure of the samples were investigated by X-ray diffraction (XRD) technique, optical microscopy (OM) and scanning electro...

Growth and Characterization of Ti-Si-N Thin Films

High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target

We have deposited Ti-Si-C thin films using high-power impulse magnetron sputtering (HIPIMS) from a Ti3SiC2 compound target. The as-deposited films were composite materials with TiC as the main crystalline constituent. X-ray diffraction and photoelectron spectroscopy indicated that they also contained amorphous SiC, and for films deposited on inclined substrates, crystalline Ti5Si3Cx. The film m...

Growth and Phase Stability Studies of Epitaxial Sc-Al-N and Ti-Al-N Thin Films

Multifunctional nanostructured Ti-Si-C thin films

In this Thesis, I have investigated multifunctional nanostructured Ti-Si-C thin films synthesized by magnetron sputtering in the substrate-temperature range from room temperature to 900 °C. The studies cover high-temperature growth of Ti3SiC2 and Ti4SiC3, low-temperature growth of Ti-Si-C nanocomposites, and Ti-Si-C-based multilayers, as well as their electrical, mechanical, and thermal-stabili...